Semiconductor Workflows: From Fabrication to Characterisation

Discover how complementary processing and characterisation technologies can provide deeper insight into semiconductor materials, processes and devices.

In this webinar, Dr. Kate Stokes explores Oxford Instruments’ semiconductor workflow, beginning with an overview of plasma-based etch and deposition technologies used across research, process development and high-volume manufacturing.

She then introduces complementary characterisation techniques, including:

• Atomic force microscopy
• Raman spectroscopy
• Photoluminescence
• Energy-dispersive X-ray spectroscopy
• Nanoindentation

With semiconductor application examples, these techniques are employed to reveal:

• Surface morphology
• Composition
• Stress
• Crystallinity
• Electrical and optical behaviour
• Mechanical properties

The webinar concludes with a published case study on an ALD-grown MoS₂ thin film, demonstrating how AFM, Raman spectroscopy, SEM and EDS can be correlated to investigate non-uniform film growth and inform further process optimisation.